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纯镍金相腐蚀中化学抛光方法的研究

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纯镍金相腐蚀中化学抛光方法的研究

作者:赵堂昌凌得魁

来源:《上海有色金属》2014年第02期

作者简介:赵堂昌(1982-),男,工程师,主要从事与金属材料相关的现场技术工作.

摘要:对纯镍化学抛光方法中抛光剂的组成、抛光温度和抛光时间进行了研究.结果表明:用正交试验方法确定金属的抛光配方可行,此方法可以用于其他金属或合金;纯镍抛光的较佳腐蚀液配方的体积分数为正磷酸4.8%、硫酸66.7%和盐酸28.5%,腐蚀时间为15 min;该方法可以一次进行多组试样的化学抛光.

关键词:化学抛光; 抛光剂; 抛光温度; 抛光时间; 正交试验

中图分类号: TG 175.3文献标志码: A

A Study on Metallurgical Corrosion of Pure Nickel

by Chemical Polishing

ZHAO Tong chang, LING De kui

(Nickel & Cobalt Research and Engineering Institute,

Jinchuan Group Co., Ltd., Jinchang 737100, China)

Abstract: The experiments were conducted on the polishing agent that is used in the chemical polishing of pure nickel.The study of the composition of the agent,polishing temperature and polishing time proves the feasibility of the orthogonal method in determining the formulation and the applicability of this method to other metals or alloys.It is also found that by means of the orthogonal method favorable results can be obtained from a series of pure nickel metallographic samples by chemical polishing.

Key words: chemical polishing;polishing agent; polishing temperature; polishing time; orthogonal experiment

0前言

一些小的科研院所具有为生产单位提供金相检测的职能,但又不具有相关的金相检测设备,需使用其他单位的检测设备,辅助时间耗时较长,同时传统机械抛光机一次磨抛的样品数量有限,造成检测效率低下;在实际检测工作中发现纯镍的金相样品制备较难掌握,需要有一定的经验积累.为此急需找到一种易于操作、效率高和不依赖抛光设备的抛光方法.

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