纳米材料
来源:电子科技文摘
年:2006
卷:000
期:002
页码:P.
页数:1
中图分类:TB381
正文语种:CHI
摘要:0603020 SILD法沉积纳米级SnO2薄膜的结构和气体响应特性
=Structural and gas response characterization of nano-size SnO2 films deposited by SILD method [刊,英]/G. Korotcenkov, V.
Macsanov//Electronics Letters. -2003, 96(3).-602-609(E)